000 01443nam a22004335a 4500
001 188680
003 AR-Cies
005 20251029170508.0
008 980812s1998 dcu b 000 0 eng d
010 _a 98229729
020 _a1563968312
_qset
020 _a1563968193
_qpt. 1
020 _a1563968207
_qp. 2
020 _a9781563968310
_q(set)
020 _a9781563968198
_q(pt. 1)
020 _a9781563968204
_q(p. 2)
035 _a188680
035 _a(OCoLC)39682152
040 _aDBS
_cDBS
_dNBuU
_dDLC
042 _alccopycat
050 0 0 _aIN PROCESS (UTILITY LOAD)
100 _aMalcolm W. Chase, Jr.
_911345
245 0 0 _aNIST-JANAF thermochemical tables
250 _a4th ed.
260 _aWashington, DC :
_bAmerican Chemical Society ;
_aNew York :
_bAmerican Institute of Physics for the National Institute of Standards and Technology,
_c1998.
300 _a2 v. ;
_c29 cm.
336 _atext
_btxt
_2rdacontent
337 _aunmediated
_bn
_2rdamedia
338 _avolume
_bnc
_2rdacarrier
650 0 _aThermochemistry
_xTables.
_911346
650 0 _aMATERIAL DE REFERENCIA
_97628
650 0 _aTABLAS
_98484
700 1 _aChase, M. W.
_911347
710 2 _aNational Institute of Standards and Technology (U.S.)
_911348
906 _a0
_bibc
_ccopycat
_d2
_encip
_f19
_gy-gencatlg
942 _2udc
_cREF
_n0
999 _c35199
_d35198