000 00965cam a2200277 i 4500
999 _c32217
_d32217
001 4110121
003 AR-SmCIES
005 20190104130412.0
008 760810s1976 enka rb 001 0 eng d
080 _a539.188
100 1 _aTownsend, P. D.
_q(Peter David)
_91742
245 1 0 _aIon implantation, sputtering and their applications /
_cby P. D. Townsend, J. C. Kelly, N. E. W. Hartley.
260 _aLondon ;
_aNew York :
_bAcademic Press,
_c1976.
300 _aix, 333 p. :
_bil. ;
_c24 cm.
504 _aBibliografĂ­a al final de cada capĂ­tulo.
650 7 _aION IMPLANTATION
_2inist
_91743
650 7 _aIMPLANTACION DE IONES
_2inist
_91744
650 7 _aCHISPORROTEO
_2inist
_91745
650 7 _aSPUTTERING
_2inist
_91746
700 1 _aKelly, J. C.
_q(John Clive),
_91747
700 1 _aHartley, N. E. W.,
_91748
942 _2udc
_cBK